Phosphorus atomic layer doping in SiGe using reduced pressure chemical vapor deposition
| Autor: | Yamamoto, Yuji, Heinemann, Bernd, Murota, Junichi, Tillack, Bernd |
|---|---|
| Zdroj: | In Thin Solid Films 30 April 2014 557:14-18 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect