Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization
| Autor: | Yeo, Seungmin, Choi, Sang-Hyeok, Park, Ji-Yoon, Kim, Soo-Hyun, Cheon, Taehoon, Lim, Byoung-Yong, Kim, Sunjung |
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| Zdroj: | In Thin Solid Films 1 November 2013 546:2-8 |
| Databáze: | ScienceDirect |
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