Low-temperature crystallization of amorphous silicon and amorphous germanium by soft X-ray irradiation
| Autor: | Heya, Akira, Kanda, Kazuhiro, Toko, Kaoru, Sadoh, Taizoh, Amano, Sho, Matsuo, Naoto, Miyamoto, Shuji, Miyao, Masanobu, Mochizuki, Takayasu |
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| Zdroj: | In Thin Solid Films 1 May 2013 534:334-340 |
| Databáze: | ScienceDirect |
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