Ultimate nanopatterning of Si substrate using filtered liquid metal alloy ion source-focused ion beam

Autor: Benkouider, A., Berbezier, I., Ronda, A., Favre, L., Gomes, E. Ruiz, Marcus, I.C., Alonso, I., Delobbe, A., Sudraud, P.
Zdroj: In Thin Solid Films 30 September 2013 543:69-73
Databáze: ScienceDirect