Structural properties of Al2O3/AlN thin film prepared by magnetron sputtering of Al in HF-activated nitrogen plasma
| Autor: | Dallaeva, D.S., Bilalov, B.A., Gitikchiev, M.A., Kardashova, G.D., Safaraliev, G.K., Tománek, P., Škarvada, P., Smith, S. |
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| Zdroj: | In Thin Solid Films 30 December 2012 526:92-96 |
| Databáze: | ScienceDirect |
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