Effect of the very high frequency plasma with a balanced power feeding on silicon film deposition
| Autor: | Muta, Hiroshi, Mizuno, Kenta, Nishida, Satoshi, Kuribayashi, Shizuma |
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| Zdroj: | In Thin Solid Films 15 November 2012 523:41-45 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect