High resolution Rutherford Backscattering Spectrometry investigations of ZrO2 layer growth in the initial stage on native silicon oxide and titanium nitride
| Autor: | Vieluf, M., Munnik, F., Neelmeijer, C., Kosmata, M., Teichert, S. |
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| Zdroj: | In Thin Solid Films 1 July 2012 520(18):5900-5905 |
| Databáze: | ScienceDirect |
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