Comparative analysis of oxide phase formation and its effects on electrical properties of SiO2/InSb metal-oxide-semiconductor structures

Autor: Lee, Jaeyel, Park, Sehun, Kim, Jungsub, Yang, Changjae, Kim, Sujin, Seok, Chulkyun, Park, Jinsub, Yoon, Euijoon
Zdroj: In Thin Solid Films 1 June 2012 520(16):5382-5385
Databáze: ScienceDirect