Improvement of InN layers deposited on Si(111) by RF sputtering using a low-growth-rate InN buffer layer

Autor: Valdueza-Felip, S., Ibáñez, J., Monroy, E., González-Herráez, M., Artús, L., Naranjo, F.B.
Zdroj: In Thin Solid Films 31 January 2012 520(7):2805-2809
Databáze: ScienceDirect