Temperature-driven local rearrangement in the Er environment of Er-doped silica glass films prepared by rf-cosputtering deposition
| Autor: | Gonella, F., Battaglin, G., Cattaruzza, E., Trave, E., Leto, A., Pezzotti, G. |
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| Zdroj: | In Thin Solid Films 1 May 2012 520(14):4758-4761 |
| Databáze: | ScienceDirect |
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