Evaluations of intrinsic time dependent dielectric breakdown of dielectric copper diffusion barriers
| Autor: | Zhao, Larry, Lofrano, Melina, Croes, Kristof, Van Besien, Els, Tőkei, Zsolt, Wilson, Christopher J., Degraeve, Robin, Kauerauf, Thomas, Beyer, Gerald P., Claeys, Cor |
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| Zdroj: | In Thin Solid Films 2011 520(1):662-666 |
| Databáze: | ScienceDirect |
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