The effect of argon pressure, residual oxygen and exposure to air on the electrical and microstructural properties of sputtered chromium thin films
| Autor: | Foroughi-Abari, Ali, Xu, Can, Cadien, Kenneth C. |
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| Zdroj: | In Thin Solid Films 2012 520(6):1762-1767 |
| Databáze: | ScienceDirect |
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