Analysis of gate oxide damage by ultraviolet light during oxide deposition in high density plasma
| Autor: | Kim, Dong Kwon, Lee, JeongYun, Kim, Dong-Hwan, Shin, Kyoungsub, Kim, Myeong-Cheol, Choi, SiYoung, Kang, ChangJin |
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| Zdroj: | In Thin Solid Films 2011 519(20):6645-6648 |
| Databáze: | ScienceDirect |
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