Influence of thermal oxidation on the interfacial properties of ultrathin strained silicon layers
| Autor: | Ioannou-Sougleridis, V., Kelaidis, N., Skarlatos, D., Tsamis, C., Georga, S.N., Krontiras, C.A., Komninou, Ph., Speliotis, Th., Dimitrakis, P., Kellerman, B., Seacrist, M. |
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| Zdroj: | In Thin Solid Films 1 June 2011 519(16):5456-5463 |
| Databáze: | ScienceDirect |
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