Single-chamber filament-assisted chemical vapor deposition of polymer and organosilicate films for air gap interconnect formation

Autor: Lee, Eric, Faguet, Jacques, Brcka, Jozef, Akiyama, Osayuki, Liu, Junjun, Toma, Dorel
Zdroj: In Thin Solid Films 2011 519(14):4571-4573
Databáze: ScienceDirect