Preparation of SnO 2 thin films at low temperatures with H 2 gas by the hot-wire CVD method

Autor: Natsuhara, H. a, c, ⁎, Tatsuyama, T. b, Ushiro, M. b, Furuhashi, M. a, Fujii, T. a, Ohashi, F. b, Yoshida, N. b, c, Nonomura, S. b, c
Zdroj: In Thin Solid Films 2011 519(14):4538-4541
Databáze: ScienceDirect