High-rate reduction of copper oxide using atmospheric-pressure inductively coupled plasma microjets

Autor: Tajima, Satomi, Tsuchiya, Shouichi, Matsumori, Masashi, Nakatsuka, Shigeki, Ichiki, Takanori
Zdroj: In Thin Solid Films 2011 519(20):6773-6777
Databáze: ScienceDirect