Application of scatterometric porosimetry to characterize porous ultra low-k patterned layers

Autor: Licitra, C., Bouyssou, R., El Kodadi, M., Haberfehlner, G., Chevolleau, T., Hazart, J., Virot, L., Besacier, M., Schiavone, P., Bertin, F.
Zdroj: In Thin Solid Films 28 February 2011 519(9):2825-2829
Databáze: ScienceDirect