Spectroscopic ellipsometry characterization of high-k gate stacks with Vt shift layers

Autor: Di, Ming, Bersch, Eric, Clark, Robert, Consiglio, Steven, Leusink, Gert, Diebold, Alain C.
Zdroj: In Thin Solid Films 28 February 2011 519(9):2889-2893
Databáze: ScienceDirect