Dielectric functions of PECVD-grown silicon nanoscale inclusions within rapid thermal annealed silicon-rich silicon nitride films

Autor: Keita, A.-S., En Naciri, A., Delachat, F., Carrada, M., Ferblantier, G., Slaoui, A., Stchakovsky, M.
Zdroj: In Thin Solid Films 28 February 2011 519(9):2870-2873
Databáze: ScienceDirect