Effects of precursor evaporation temperature on the properties of the yttrium oxide thin films deposited by microwave electron cyclotron resonance plasma assisted metal organic chemical vapor deposition
| Autor: | Barve, S.A., Jagannath, Mithal, N., Deo, M.N., Biswas, A., Mishra, R., Kishore, R., Bhanage, B.M., Gantayet, L.M., Patil, D.S. |
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| Zdroj: | In Thin Solid Films 2011 519(10):3011-3020 |
| Databáze: | ScienceDirect |
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