Dissolution kinetics of Si into Ge (111) substrate on the nanoscale
| Autor: | Balogh, Zoltán, Erdélyi, Zoltán, Beke, Dezső L., Wiedwald, Ulf, Pfeiffer, Holger, Tschetschetkin, Anna, Ziemann, Paul |
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| Zdroj: | In Thin Solid Films 2010 519(2):952-955 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect