Fourier transform infrared spectroscopy characterization of AlN thin films grown on sacrificial silicon oxide layers via metal organic vapor phase epitaxy
Autor: | Kuchibhatla, S., Rodak, L.E., Korakakis, D. |
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Zdroj: | In Thin Solid Films 2010 519(1):117-121 |
Databáze: | ScienceDirect |
Externí odkaz: |