Study of the refractive index change in a-Si:H thin films patterned by 532 nm laser radiation for photovoltaic applications

Autor: Colina, M., Molpeceres, C., Holgado, M., Gandia, J., Nos, O., Ocaña, J.L.
Zdroj: In Thin Solid Films 2010 518(18):5331-5339
Databáze: ScienceDirect