Low-temperature formation of silicon dioxide films by oxygen cluster ion beam assisted deposition
| Autor: | Ryuto, Hiromichi, Yakushiji, Takashi, Jin, Xin, Takaoka, Gikan H. |
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| Zdroj: | In Thin Solid Films 2010 518(21) Supplement:S2-S5 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect