Comparison of the top-down and bottom-up approach to fabricate nanowire-based silicon/germanium heterostructures
| Autor: | Wolfsteller, A., Geyer, N., Nguyen-Duc, T.-K., Das Kanungo, P., Zakharov, N.D., Reiche, M., Erfurth, W., Blumtritt, H., Kalem, S., Werner, P., Gösele, U. |
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| Zdroj: | In Thin Solid Films 2010 518(9):2555-2561 |
| Databáze: | ScienceDirect |
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