LiF enhanced nucleation of the low temperature microcrystalline silicon prepared by plasma enhanced chemical vapour deposition
| Autor: | Stuchlík, Jiří, Ledinský, Martin, Honda, Shinya, Drbohlav, Ivo, Mates, Tomáš, Fejfar, Antonín, Hruška, Karel |
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| Zdroj: | In Thin Solid Films 2009 517(24):6829-6832 |
| Databáze: | ScienceDirect |
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