The correlation between mechanical stress, thermal shift and refractive index in HfO 2, Nb 2O 5, Ta 2O 5 and SiO 2 layers and its relation to the layer porosity

Autor: Stenzel, O., Wilbrandt, S., Kaiser, N., Vinnichenko, M., Munnik, F., Kolitsch, A., Chuvilin, A., Kaiser, U., Ebert, J., Jakobs, S., Kaless, A., Wüthrich, S., Treichel, O., Wunderlich, B., Bitzer, M., Grössl, M.
Zdroj: In Thin Solid Films 2009 517(21):6058-6068
Databáze: ScienceDirect