Substrate current enhancement in 65 nm metal-oxide-silicon field-effect transistor under external mechanical stress
| Autor: | Kuo, Y.J., Chang, T.C., Yeh, P.H., Chen, S.C., Dai, C.H., Chao, C.H., Young, T.F., Cheng, Osbert, Huang, C.T. |
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| Zdroj: | In Thin Solid Films 2009 517(5):1715-1718 |
| Databáze: | ScienceDirect |
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