Structure and thermal stability of arc evaporated (Ti 0.33Al 0.67) 1 − xSi xN thin films
| Autor: | Flink, A., Andersson, J.M., Alling, B., Daniel, R., Sjölén, J., Karlsson, L., Hultman, L. |
|---|---|
| Zdroj: | In Thin Solid Films 2008 517(2):714-721 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect