pMOS transistor with embedded SiGe: Elastic and plastic relaxation issues

Autor: Hikavyy, A., Bhouri, N., Loo, R., Verheyen, P., Clemente, F., Hopkins, J., Trussell, R., Caymax, M.
Zdroj: In Thin Solid Films 2008 517(1):113-116
Databáze: ScienceDirect