High-quality epitaxial Si growth at low temperatures by atmospheric pressure plasma CVD
| Autor: | Yasutake, K., Ohmi, H., Kirihata, Y., Kakiuchi, H. |
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| Zdroj: | In Thin Solid Films 2008 517(1):242-244 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Yasutake, K., Ohmi, H., Kirihata, Y., Kakiuchi, H. |
|---|---|
| Zdroj: | In Thin Solid Films 2008 517(1):242-244 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect