Initial oxidation of HF-acid treated SiGe(100) surfaces under air exposure investigated by synchrotron radiation X-ray photoelectron spectroscopy and IR absorption spectroscopy

Autor:	Narita, Yuzuru, Hirose, Fumihiko, Nagato, Masaya, Kinoshita, Yuta
Zdroj:	In Thin Solid Films 2008 517(1):209-212
Databáze:	ScienceDirect
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect