Characterizations of polycrystalline SiGe films on SiO 2 grown by gas-source molecular beam deposition
Autor: | Mitsui, M., Tamoto, M., Arimoto, K., Yamanaka, J., Nakagawa, K., Sato, T., Usami, N., Sawano, K., Shiraki, Y. |
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Zdroj: | In Thin Solid Films 2008 517(1):254-256 |
Databáze: | ScienceDirect |
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