Characterizations of polycrystalline SiGe films on SiO 2 grown by gas-source molecular beam deposition

Autor: Mitsui, M., Tamoto, M., Arimoto, K., Yamanaka, J., Nakagawa, K., Sato, T., Usami, N., Sawano, K., Shiraki, Y.
Zdroj: In Thin Solid Films 2008 517(1):254-256
Databáze: ScienceDirect