Investigation of lanthanum and hafnium-based dielectric films by X-ray reflectivity, spectroscopic ellipsometry and X-ray photoelectron spectroscopy

Autor: Edon, V., Hugon, M.-C., Agius, B., Durand, O., Eypert, C., Cardinaud, C.
Zdroj: In Thin Solid Films 2008 516(22):7974-7978
Databáze: ScienceDirect