Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications
| Autor: | Biasotto, C., Diniz, J.A., Daltrini, A.M., Moshkalev, S.A., Monteiro, M.J.R. |
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| Zdroj: | In Thin Solid Films 2008 516(21):7777-7782 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect