Reactive sputtering of Al 2O 3 on AlGaN/GaN heterostructure field-effect transistor
| Autor: | Jhin, J., Kang, H., Byun, D., Kim, D., Adesida, I. |
|---|---|
| Zdroj: | In Thin Solid Films 2008 516(18):6483-6486 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
| Autor: | Jhin, J., Kang, H., Byun, D., Kim, D., Adesida, I. |
|---|---|
| Zdroj: | In Thin Solid Films 2008 516(18):6483-6486 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect