Polymorphous silicon thin films deposited at high rate: Transport properties and density of states

Autor: Soro, Y.M., Abramov, A., Gueunier-Farret, M.E., Johnson, E.V., Longeaud, C., Roca i Cabarrocas, P., Kleider, J.P.
Zdroj: In Thin Solid Films 2008 516(20):6888-6891
Databáze: ScienceDirect