Formation of silicon carbide at low temperatures by chemical transport of silicon induced by atmospheric pressure H 2/CH 4 plasma
| Autor: | Kakiuchi, H., Ohmi, H., Yasutake, K. |
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| Zdroj: | In Thin Solid Films 2008 516(19):6580-6584 |
| Databáze: | ScienceDirect |
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Full Text from ScienceDirect