Coverage properties of SiN x films prepared by catalytic chemical vapor deposition on trenched substrates below 80 °C
| Autor: | Heya, Akira, Minamikawa, Toshiharu, Niki, Toshikazu, Minami, Shigehira, Masuda, Atsushi, Umemoto, Hironobu, Matsuo, Naoto, Matsumura, Hideki |
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| Zdroj: | In Thin Solid Films 2008 516(10):3000-3004 |
| Databáze: | ScienceDirect |
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