Chemical vapour deposition of praseodymium oxide films on silicon: influence of temperature and oxygen pressure
| Autor: | Abrutis, A., Lukosius, M., Saltyte, Z., Galvelis, R., Baumann, P.K., Schumacher, M., Lindner, J. |
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| Zdroj: | In Thin Solid Films 2008 516(15):4758-4764 |
| Databáze: | ScienceDirect |
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