Investigation of particle reduction and its transport mechanism in UHF-ECR dielectric etching system
| Autor: | Kobayashi, Hiroyuki, Yokogawa, Ken'etsu, Maeda, Kenji, Izawa, Masaru |
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| Zdroj: | In Thin Solid Films 2008 516(11):3469-3473 |
| Databáze: | ScienceDirect |
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