Molecular dynamics simulation of microcrystalline Si deposition processes by silane plasmas
| Autor: | Matsukuma, Masaaki, Hamaguchi, Satoshi |
|---|---|
| Zdroj: | In Thin Solid Films 2008 516(11):3443-3448 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Matsukuma, Masaaki, Hamaguchi, Satoshi |
|---|---|
| Zdroj: | In Thin Solid Films 2008 516(11):3443-3448 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect