Interfacial microstructure of NiSi x/HfO 2/SiO x/Si gate stacks

Autor: Gribelyuk, M.A., Cabral, C., Jr., Gusev, E.P., Narayanan, V.
Zdroj: In Thin Solid Films 2007 515(13):5308-5313
Databáze: ScienceDirect