Epitaxial growth and relaxation of γ-Al 2O 3 on silicon

Autor: Merckling, C., El-Kazzi, M., Favre-Nicolin, V., Gendry, M., Robach, Y., Grenet, G., Hollinger, G.
Zdroj: In Thin Solid Films 2007 515(16):6479-6483
Databáze: ScienceDirect