Epitaxial growth and relaxation of γ-Al 2O 3 on silicon
Autor: | Merckling, C., El-Kazzi, M., Favre-Nicolin, V., Gendry, M., Robach, Y., Grenet, G., Hollinger, G. |
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Zdroj: | In Thin Solid Films 2007 515(16):6479-6483 |
Databáze: | ScienceDirect |
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