Optimized measurement of strained Si thickness and SiGe virtual substrate composition by spectroscopic ellipsometry
Autor: | Vineis, C.J., Erdtmann, M., Leitz, C.W. |
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Zdroj: | In Thin Solid Films 2006 513(1):78-83 |
Databáze: | ScienceDirect |
Externí odkaz: |