5 nm thick lanthanum oxide thin films grown on Si(100) by atomic layer deposition: The effect of post-annealing on the electrical properties
| Autor: | Jo, Sang Jin, Ha, Jeong Sook, Park, Nam Kyun, Kang, Dong Kyun, Kim, Byong-Ho |
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| Zdroj: | In Thin Solid Films 2006 513(1):253-257 |
| Databáze: | ScienceDirect |
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