On the lower thickness boundary of sputtered TiNi films for shape memory application

Autor: Fu, Y.Q., Zhang, Sam, Wu, M.J., Huang, W.M., Du, H.J., Luo, J.K., Flewitt, A.J., Milne, W.I.
Zdroj: In Thin Solid Films 2006 515(1):80-86
Databáze: ScienceDirect