Electrical properties of B-doped polycrystalline silicon thin films prepared by rapid thermal chemical vapour deposition

Autor: Ai, Bin, Shen, Hui, Liang, Zongcun, Chen, Zhi, Kong, Guanglin, Liao, Xianbo
Zdroj: In Thin Solid Films 21 February 2006 497(1-2):157-162
Databáze: ScienceDirect