Strain relaxation processes in strained-Si layer on SiGe-on-insulator substrates
| Autor: | Hirashita, Norio, Sugiyama, Naoharu, Toyoda, Eiji, Takagi, Shin-ichi |
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| Zdroj: | In Thin Solid Films 2006 508(1):112-116 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
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| Autor: | Hirashita, Norio, Sugiyama, Naoharu, Toyoda, Eiji, Takagi, Shin-ichi |
|---|---|
| Zdroj: | In Thin Solid Films 2006 508(1):112-116 |
| Databáze: | ScienceDirect |
| Externí odkaz: |
|
Full Text from ScienceDirect